Other Inductively Coupled Plasma

Designed for high-etching semiconductor processing.

Call our global sales and customer support team on +44 (0) 2380 667 486 for more information.

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1 year warranty

High efficiency

High quality

Outstanding reliability

Information

Machine Model

Inductively Coupled Plasma

Manufacturer

Other

Key Features

1 year warranty, High efficiency, High quality, Outstanding reliability

Description:

Designed for high-etching semiconductor processing. The high plasma density can be adapted to a variety of plasma etching applications.

Technical Data

Specification

Chamber effective size

Rotary table: Ø360mm; Wafer capacity of 1200 tablets

Power

1000W @ 13.56MHz

Machine dimensions

1050 x 1620 x 770mm (WHD)

Vacuum pump mechanical

47CFM

Vacuum pump dry air flow requirements

0 ~ 60L/min

For further information about our range of Plasma machines, or parts available on these products call us on +44 (0) 2380 667 486